Atomic layer deposition and its derivatives for extreme ultraviolet (EUV) photoresist applications

Author

Dan N. Le, Taehee Park, Su Min Hwang, Jin-Hyun Kim, Yong Chan Jung, Nikhil Tiwale, Ashwanth Subramanian, Won-Il Lee, Rino Choi, Myung M. Sung

Journal

Japanese Journal of Applied Physics

Vol

62

Page

-

Year

2023.06