Investigation of Initial Formation of Aluminium Nitride Films by Single Precursor Organometallic Chemical Vaper Deposition of [Me2Al(μ-NHR)]2 (R=iPr, tBu)

Author

M.M Sung, H.D Jung, J Kim, S Kim, J.T Park, Y Kim

Journal

KOREAN CHEM

Vol

15

Page

1

Year

1994