Vapor-phase dry development enabling high-resolution and improved CDU in EUV photoresists

Author

Ji-Hoo Seok, Jiwon Kim, Hyeonseok Ji, Jaehyuk Lee, Taeho Lee, Kwang-sub Yoon, Myung Mo Sung, Jinho Ahn

Journal

SPIE

Vol

13983

Page

614-617

Year

2026.04